2026-10-12T22:12:55Zhttps://www.radar-service.eu/oai/OAIHandler

10.35097/pgppvxcdzrwjn3ns2026-10-09T10:50:09Zradar4kit

https://dx.doi.org/10.35097/pgppvxcdzrwjn3ns Schliephake, Daniel Ramdoss, Sri Rathinamani Vikram, Raja Jothi Falcão, Gabriely Galgon, Florian Thota, Hemanth Hinrichs, Frauke Zenk, Christopher Kauffmann, Alexander Eggeler, Yolita M. Suwas, Satyam Schwaiger, Ruth Heilmaier, Martin Data from "Microstructure and mechanical properties of a laser-based directed energy deposited Mo-Si-Ti alloy" Karlsruhe Institute of Technology 2025 Materials Science dataset Dataset info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by-nc-sa/4.0/legalcode Raw data set to "Microstructure and mechanical properties of a laser-based directed energy deposited Mo-Si-Ti alloy". The data sets are labelled according to the figures in the manuscript. DED-v or DED-h refers to the eutectic Mo-20Si-52.8Ti alloy manufactured by DED-LB in the vertical or horizontal direction with respect to the build direction AC referes to the eutectic Mo-20Si-52.8Ti alloy manufactured by arc melting in as-cast condtion HT refers to the eutectic Mo-20Si-52.8Ti alloy manufactured by arc melting in annealed condtion (1600°C/150h) Fig.1a = Scanning electron grayscale micrographs using secondary electron contrast as *.jpg image of powder particles Fig.1b = Cumulative frequency as a function of powder size ad aspect ratio Fig.2a = Scanning electron grayscale micrographs using backscattered electron contrast as *.jpg image of DED-v Fig.2b = Scanning electron grayscale micrographs using backscattered electron contrast as *.jpg image of DED-h Fig.2c = Scanning electron grayscale micrographs using backscattered electron contrast as *.jpg image of AC Fig.2d = Scanning electron grayscale micrographs using backscattered electron contrast as *.jpg image of HT Fig.3 = Color-coded IPF maps of (a) (Mo,Ti,Si) solid solution and (b) (Ti,Mo)5Si3. (c) + (d) Orientation relationship of Mo,Ti,Si) solid solution and (Ti,Mo)5Si3 Fig.4a = True stress as a function of true strain at 900°C for DED-v, AC and HT Fig.4b = 0.2% offset yield strength as a function of testing temperature for DED-v, DED-h, AC and HT Fig.4c = Strain rate dependent 0.2% offset yield strength at 900°C for DED-v, AC and HT Fig.4d = Arrhenius plot at 200MPa for DED-v, AC and HT Fig.5 = Scanning electron grayscale micrographs using backscattered electron contrast as *.jpg image of DED-v after compression strain of 6% KNMFi proposal 2022-029 031563 https://publikationen.bibliothek.kit.edu/1000182713 application/x-tar